ADSORPTION OF H//2O AND O//2 ON Rh SURFACES STUDIED BY AES, ELS AND TDS.

Research output: Contribution to journalArticle

Abstract

The interaction of water with clean, boron and oxygen pre-covered Rh surfaces was studied by AES, ELS (in electronic range) and TDS. Water vapor undergoes reversible molecular adsorption and desorption on clean Rh(111) and Rh foil. The weakly chemisorbed layer desorbed with a peak temperature of 182-200 K. Above 0. 5 L exposure a second peak was developed at a peak maximum of 158 K, which corresponds to the formation of a multilayer of ice. The adsorbed water produced three losses at 14, 10. 4 and 8. 7 ev. The presence of surface boron caused the dissociation of adsorbed water which was indicated by evolution of H//2 and appearance of 9. 4 ev loss above 200 K due to the formation of B-O bonds. The adsorption of oxygen on boron-contaminated Rh foil also produced this loss.

Original languageEnglish
Pages (from-to)194
Number of pages1
JournalVacuum
Volume37
Issue number1-2
Publication statusPublished - 1985

Fingerprint

Boron
boron
Adsorption
Metal foil
adsorption
Water
foils
water
Oxygen
Steam
Ice
oxygen
Water vapor
water vapor
Desorption
Multilayers
ice
desorption
dissociation
Hydrogen

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

ADSORPTION OF H//2O AND O//2 ON Rh SURFACES STUDIED BY AES, ELS AND TDS. / Kiss, J.; Solymosi, F.

In: Vacuum, Vol. 37, No. 1-2, 1985, p. 194.

Research output: Contribution to journalArticle

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