A Simple Model for Ion Flux-Energy Distribution Functions in Capacitively Coupled Radio-Frequency Plasmas Driven by Arbitrary Voltage Waveforms

Edmund Schüngel, Z. Donkó, Julian Schulze

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

The ion flux-energy distribution function (IFEDF) is of crucial importance for surface processing applications of capacitively coupled radio-frequency (CCRF) plasmas. Here, we propose a model that allows for the determination of the IFEDF in such plasmas for various gases and pressures in both symmetric and asymmetric configurations. A simplified ion density profile and a quadratic charge voltage relation for the plasma sheaths are assumed in the model, of which the performance is evaluated for single- as well as multi-frequency voltage waveforms. The IFEDFs predicted by this model are compared to those obtained from PIC/MCC simulations and retarding field energy analyzer measurements. Furthermore, the development of the IFEDF shape and the ion dynamics in the plasma sheath region are discussed in detail based on the spatially and temporally resolved model data.

Original languageEnglish
Article number1600117
JournalPlasma Processes and Polymers
Volume14
Issue number4-5
DOIs
Publication statusPublished - Apr 1 2017

Fingerprint

Distribution functions
radio frequencies
energy distribution
waveforms
distribution functions
Ions
Fluxes
Plasmas
plasma sheaths
Plasma sheaths
Electric potential
electric potential
ions
Plasma Gases
analyzers
retarding
profiles
configurations
gases
Processing

Keywords

  • capacitively coupled radio frequency plasmas
  • ion bombardment
  • ion-energy distribution function (IEDF)
  • plasma modeling
  • radio frequency glow discharges (RFGD)

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Polymers and Plastics

Cite this

A Simple Model for Ion Flux-Energy Distribution Functions in Capacitively Coupled Radio-Frequency Plasmas Driven by Arbitrary Voltage Waveforms. / Schüngel, Edmund; Donkó, Z.; Schulze, Julian.

In: Plasma Processes and Polymers, Vol. 14, No. 4-5, 1600117, 01.04.2017.

Research output: Contribution to journalArticle

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