A cross-sectional high-resolution transmission electron microscopy study of electrodeposited Ni-Cu/Cu multilayers

Á Cziráki, V. Pierron-Bohnes, C. Ulhaq-Bouillet, E. Tóth-Kádár, I. Bakonyi

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18 Citations (Scopus)

Abstract

This work is an extension of our previous structural study performed by conventional transmission electron microscopy (TEM) on electrodeposited Ni-Cu/Cu multilayers exhibiting giant magnetoresistance (GMR). It could be established from the present atomic-resolution structural studies that (i) the layered structure found by conventional TEM to be flat and smooth shows an interface roughness spread over a few atomic monolayers; (ii) the atomic planes cross, in most cases, continuously the Ni-Cu/Cu interface, i.e., forming a coherent superlattice; (iii) the atomic planes exhibit a periodic distortion due to the unrelaxed strain induced by the lattice mismatch between the magnetic and non-magnetic constituent layers.

Original languageEnglish
Pages (from-to)239-242
Number of pages4
JournalThin Solid Films
Volume318
Issue number1-2
DOIs
Publication statusPublished - Apr 15 1998

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Keywords

  • Electrodeposition
  • Giant magnetoresistance
  • High-resolution transmission electron microscopy
  • Ni-Cu/Cu multilayers

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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